Cybersecurity Internship Winter 2027 - Payments

Location: Fairfax, VA Department: Consultant Development Program (CDP) Employment Type: Intern-CDP Location Type: Onsite

Consultant Development Program (Winter)

at Tevora

Irvine, CA, and Fairfax, VA - DC Local

(Winter): Our anticipated dates for this cohort will be January 25 - April 2

If you haven't heard of Tevora, it's because we've done our job!

Tevora is a tight-knit community of professionals with a shared passion for our craft. Every day, we combine in-depth knowledge of cybersecurity, technology, and compliance to help create more secure digital environments. To Tevorans, every problem is a puzzle in need of solving. We strongly believe that if we put smart, driven people in a room together, they will accomplish great things. We maintain a supportive culture that celebrates continuous learning, diverse perspectives, and sharing the wins. That's why we have our eyes on you.

What is the Cybersecurity Consultant Development Program?

Our Cybersecurity Consultant Development Program is an immersive paid-training internship program designed to help participants strengthen the technical and professional skills needed to enter the workforce as a full-time Information Security Associate.

Thank you for your interest in our Consultant Development Program (CDP). If you are selected for this program, you will become a Developing Consultant with us. This opportunity will challenge and motivate both your aptitude and attitude in Cyber Security. Successful completion of our program as a Developing Consultant may lead to a full-time offer as an entry-level Information Security Associate.

EEOC Statement

Tevora is proud to be an Equal Opportunity Employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, gender, gender identity or expression, pregnancy, sexual orientation, gender identity, national origin, age, protected veteran status, disability status, or other applicable legally protected characteristics.