Micron Technology

Intern - F10 CVD PEE

Micron Technology

Fab 10N/X · Posted Aug 02

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Internship in Thin Films Process Engineering (Chemical Vapor Deposition) focused on Crater Defect Reduction in TEOS CVD. The intern will apply data-driven methodologies and DOE to identify defect contributors and improve crater defect signatures in the Fab10 TEOS CVD process, with deliverables including defect characterization, analysis correlating process parameters to defect behavior, and final presentation. Duration: 6 months (July 2026–December 2026) in Singapore.

What they are looking for

Data_analysis Statistical_analysis Design_of_experiments Data_handling Data_analytics

Details

Work type
Onsite
Remote eligible
No

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