Internship in Thin Films Process Engineering (Chemical Vapor Deposition) focused on Crater Defect Reduction in TEOS CVD. The intern will apply data-driven methodologies and DOE to identify defect contributors and improve crater defect signatures in the Fab10 TEOS CVD process, with deliverables including defect characterization, analysis correlating process parameters to defect behavior, and final presentation. Duration: 6 months (July 2026–December 2026) in Singapore.
What they are looking for
Details
- Work type
- Onsite
- Remote eligible
- No
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